High dielectric constant materials VLSI MOSFET applications /
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...
| Other Authors: | Huff, Howard R., Gilmer, D. C., SpringerLink (Online service) |
|---|---|
| Format: | eBook |
| Language: | English |
| Published: |
Berlin ; New York :
Springer,
2005.
|
| Physical Description: |
1 online resource (xxiv, 710 pages) : illustrations. |
| Series: |
Springer series in advanced microelectronics ;
16. |
| Subjects: |
CMU Electronic Access
Electronic Resource Click Here| Location | Call Number: | Status |
|---|---|---|
| CMU Electronic Access | Available |