Advanced gate stacks for high-mobility semiconductors
Will nanoelectronic devices continue to scale according to Moore's law? At this moment, there is no easy answer since gate scaling is rapidly emerging as a serious roadblock for the evolution of CMOS technology. Channel engineering based on high-mobility semiconductor materials (e.g. strained S...
| Other Authors: | Dimoulas, A., SpringerLink (Online service) |
|---|---|
| Format: | eBook |
| Language: | English |
| Published: |
Berlin :
Springer,
©2007.
Berlin : [2007] |
| Physical Description: |
1 online resource (xxii, 383 pages) : illustrations. |
| Series: |
Springer series in advanced microelectronics ;
27. |
| Subjects: |
CMU Electronic Access
Electronic Resource Click Here| Location | Call Number: | Status |
|---|---|---|
| CMU Electronic Access | Available |