Interferometric metrology of photomask blanks approaches using 633 nm wavelength /
"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.
| Other Authors: | Evans, CJ., National Institute of Standards and Technology (U.S.) |
|---|---|
| Format: | Microfilm |
| Language: | English |
| Published: |
Gaithersburg, MD :
U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology,
[2002]
|
| Physical Description: |
11 pages : illustrations ; 28 cm. |
| Series: |
NISTIR ;
6701. |
| Subjects: |
CMU Storage Gov Pub Microfiche
| Location | Call Number: | Status |
|---|---|---|
| CMU Storage Gov Pub Microfiche | C 13.58:6701 | Available |