Interferometric metrology of photomask blanks approaches using 633 nm wavelength /

"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.

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Bibliographic Details
Corporate Author: National Institute of Standards and Technology (U.S.)
Other Authors: Evans, CJ
Format: Microfilm Book
Language:English
Published: Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2002]
Series:NISTIR ; 6701.
Physical Description:
11 pages : illustrations ; 28 cm.
Subjects:
Interferometry.
Photolithography.
Optical measurements.
Optical instruments -- Testing.
Description
Summary:"The purpose of this report is to describe interferometric measurements of photomask blanks that could be made at the National Institute of Standards and Technology (NIST) using existing equipment without the use of coatings which must subsequently be removed"--P. 2.
Item Description:"December 21, 2000."
Shipping list no.: 2003-0057-M.
Reproduction:
Microfiche. [Washington, D.C.] : Supt. of Docs., U.S. G.P.O., 2002. 1 microfiche : negative..
Physical Description:
11 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references (pages 10-11)

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