Investigation on SiGe selective epitaxy for source and drain engineering in 22 nm CMOS technology node and beyond
This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling. As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of trans...
| Main Author: | Wang, Guilei, |
|---|---|
| Other Authors: | SpringerLink (Online service) |
| Format: | eBook |
| Language: | English |
| Published: |
Singapore :
Springer,
2020.
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| Physical Description: |
1 online resource. |
| Series: |
Springer theses.
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| Subjects: |
CMU Electronic Access
Electronic Resource Click Here| Location | Call Number: | Status |
|---|---|---|
| CMU Electronic Access | Available |