Results of the Monte Carlo calculation of one- and two-dimensional distributions of particles and damage ion implanted dopants in silicon /
| Main Author: | Albers, John. |
|---|---|
| Other Authors: | United States. Defense Advanced Research Projects Agency., United States. National Bureau of Standards. |
| Format: | Book |
| Language: | English |
| Published: |
Gaithersburg, MD :
U.S. Dept. of Commerce, National Bureau of Standards,
1987.
|
| Physical Description: |
iv, 667 pages : illustrations ; 28 cm. |
| Series: |
NBS special publication ;
400-79. Semiconductor measurement technology. |
| Subjects: |
CMU Storage Gov Pub Microfiche
| Location | Call Number: | Status |
|---|---|---|
| CMU Storage Gov Pub Microfiche | C 13.10:400-79 | Available |