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Electromigration in thin films and electronic devices materials and reliability /
Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...
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| Format: | eBook |
| Language: | English |
| Published: |
Oxford :
Woodhead Pub.,
2011.
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| Series: | Woodhead Publishing in materials.
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| Physical Description: |
1 online resource (xii, 329 pages) : illustrations. |
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| Online Access: | Elsevier - Click here for access |
| Copy 1 | CMU Electronic Access | Online |
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